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Nova (NASDAQ:NVMI) today announced that its ELIPSON® materials metrology solution has been selected as Tool of Record by a leading global foundry customer for advanced Gate-All-Around (GAA) manufacturing processes.
The Company has received orders and delivered several ELIPSON® tools to the customer for use in various high-volume production processes.
The selection marks a significant milestone for the ELIPSON® platform, which is designed to deliver non-destructive, in-die material characterization for the most challenging nodes in semiconductor fabrication. This selection joins the recent adoption of the Nova Metrion® platform by another GAA customer, further expanding the presence of Nova's materials metrology solutions in advanced logic nodes production.
Nova ELIPSON® leverages state-of-the-art Raman spectroscopy technology to provide precise, repeatable measurements of material properties—key requirements for next-generation device architectures. By enabling rapid, non-contact material analysis at the nanoscale, ELIPSON® supports manufacturers' needs for both innovation and efficiency in a dynamic market landscape.
Posted In: NVMI
